ASTM D5127-2007 电子学和半导体工业用超纯水标准指南
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【英文标准名称】:StandardGuideforUltra-PureWaterUsedintheElectronicsandSemiconductorIndustries
【原文标准名称】:电子学和半导体工业用超纯水标准指南
【标准号】:ASTMD5127-2007
【标准状态】:现行
【国别】:
【发布日期】:2007
【实施或试行日期】:
【发布单位】:美国材料与试验协会(US-ASTM)
【起草单位】:D19.02
【标准类型】:(Guide)
【标准水平】:()
【中文主题词】:电子工程;指南;质量;水
【英文主题词】:electronic;microelectronics;semiconductor;ultra-purewater
【摘要】:1.1Thisguideprovidesrecommendationsforwaterqualityrelatedtoelectronicsandsemiconductor-industrymanufacturing.Sixclassificationsofwateraredescribed,includingwaterforlinewidthsaslowas0.09micron.Inallcases,therecommendationsareforwateratthepointofdistribution(POD).1.2Waterisusedforwashingandrinsingofsemiconductorcomponentsduringmanufacture.Waterisalsousedforcleaningandetchingoperations,makingsteamforoxidationofsiliconsurfaces,preparingphotomasks,anddepositingluminescentmaterials.Otherapplicationsareinthedevelopmentandfabricationofsolid-statedevices,thin-filmdevices,communicationlasers,light-emittingdiodes,photo-detectors,printedcircuits,memorydevices,vacuum-tubedevices,orelectrolyticdevices.1.3Usersneedingwaterqualitiesdifferentfromthosedescribedhereshouldconsultotherwaterstandards,suchasSpecificationD1193andGuideD5196.1.4Thisstandarddoesnotpurporttoaddressallofthesafetyconcerns,ifany,associatedwithitsuse.Itistheresponsibilityoftheuserofthisstandardtoestablishappropriatesafetyandhealthpracticesanddeterminetheapplicabilityofregulatorylimitationspriortouse.
【中国标准分类号】:L04
【国际标准分类号】:13_060_25;71_100_99
【页数】:5P.;A4
【正文语种】:
【原文标准名称】:电子学和半导体工业用超纯水标准指南
【标准号】:ASTMD5127-2007
【标准状态】:现行
【国别】:
【发布日期】:2007
【实施或试行日期】:
【发布单位】:美国材料与试验协会(US-ASTM)
【起草单位】:D19.02
【标准类型】:(Guide)
【标准水平】:()
【中文主题词】:电子工程;指南;质量;水
【英文主题词】:electronic;microelectronics;semiconductor;ultra-purewater
【摘要】:1.1Thisguideprovidesrecommendationsforwaterqualityrelatedtoelectronicsandsemiconductor-industrymanufacturing.Sixclassificationsofwateraredescribed,includingwaterforlinewidthsaslowas0.09micron.Inallcases,therecommendationsareforwateratthepointofdistribution(POD).1.2Waterisusedforwashingandrinsingofsemiconductorcomponentsduringmanufacture.Waterisalsousedforcleaningandetchingoperations,makingsteamforoxidationofsiliconsurfaces,preparingphotomasks,anddepositingluminescentmaterials.Otherapplicationsareinthedevelopmentandfabricationofsolid-statedevices,thin-filmdevices,communicationlasers,light-emittingdiodes,photo-detectors,printedcircuits,memorydevices,vacuum-tubedevices,orelectrolyticdevices.1.3Usersneedingwaterqualitiesdifferentfromthosedescribedhereshouldconsultotherwaterstandards,suchasSpecificationD1193andGuideD5196.1.4Thisstandarddoesnotpurporttoaddressallofthesafetyconcerns,ifany,associatedwithitsuse.Itistheresponsibilityoftheuserofthisstandardtoestablishappropriatesafetyandhealthpracticesanddeterminetheapplicabilityofregulatorylimitationspriortouse.
【中国标准分类号】:L04
【国际标准分类号】:13_060_25;71_100_99
【页数】:5P.;A4
【正文语种】:
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